Department has modern clean room facilities for the fabrication of micro- and nanostructures including equipment for resisting, patterning, etching, and thin film coating. The patterning is performed by using an electron beam pattern generator, Ebeam EBPG5000+ES HR (Vistec) or by interferometric exposure.
The photonic structures can be metallic or dielectric ones, depending on application. The laboratory is equipped also with electroplating and nanoimprinting systems allowing flexible copying of structures on various materials.
Contact person: Markku Kuittinen
